Coating Systems

Sputtering systems Z400 and Z400neo

The laboratory sputtering systems Z400 and Z400neo each have 2 sources with HF, DC or pulsed supply (100W to 3000 W), BIAS voltage on the substrate, introduction of 3 external gases and possible integration of a sputtering process monitor Partial pressure control.

Electron Beam Evaporation System (EB-PVD) ESPRI 150

This system enables the simultaneous evaporation of different materials. The computer-controlled, quickly deflectable electron beam (“jumping beam”) enables both parallel and sequential evaporation from the two crucibles, resulting in metallic and ceramic layers in a monolithic, graded or even multi-layer arrangement in the range of a total layer thickness of up to a few 100 µm at deposition rates of up to 20 µm/ min.

Multisource magnetron sputtering system

The MEGA coating system (multi-source magnetron sputtering system) enables the production of new types of metallic or ceramic coatings in monolithic, graded or multi-layer arrangements using 7 different coating sources.