The laboratory sputtering systems Z400 and Z400neo (Systec SVS vacuum coatings, Karlstadt, Germany) have 2 sources with HF, DC or pulsed power supply (100W to 3000 W), BIAS voltage on the substrate, introduction of 3 external gases and possible integration of a sputtering process monitor to control partial pressures. The systems can therefore be used very variably to produce metallic or ceramic layers in a monolithic, graded or even multi-layer arrangement with a total layer thickness of up to a few ten µm. A sample rotation device with single and multiple sample holders and continuous rotation allows several samples to be coated in one run (batch operation). The maximum usable target diameter is 100 mm.
