Sputtering systems Z400 and Z400neo
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Magnetron sputtering system Z400
View of the sample arrangement (here: turbine blades) in the Z400 sputtering system in the chamber
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Magnetron sputtering system Z400
Opened process chamber of the Z400 sputtering system
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Employee and coating system on a laboratory scale
Die Beschichtungsanlage im Labormaßstab verfügt über zwei Kathoden (Fima Systec Z400)
The laboratory sputtering systems Z400 and Z400neo (Systec SVS vacuum coatings, Karlstadt, Germany) have 2 sources with HF, DC or pulsed power supply (100W to 3000 W), BIAS voltage on the substrate, introduction of 3 external gases and possible integration of a sputtering process monitor to control partial pressures. The systems can therefore be used very variably to produce metallic or ceramic layers in a monolithic, graded or even multi-layer arrangement with a total layer thickness of up to a few ten µm. A sample rotation device with single and multiple sample holders and continuous rotation allows several samples to be coated in one run (batch operation). The maximum usable target diameter is 100 mm.
Contact
Ramin Nodeh-Farahani
Deutsches Zentrum für Luft- und Raumfahrt
Institut für Werkstoff-Forschung
Hochtemperatur- und Funktionsschichten
Linder Höhe, 51147 Köln